Invention Grant
- Patent Title: Automated dynamic metrology sampling system and method for process control
- Patent Title (中): 自动动态计量抽样系统及过程控制方法
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Application No.: US12351010Application Date: 2009-01-09
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Publication No.: US07881891B2Publication Date: 2011-02-01
- Inventor: Javier A. Ayala , Marc J. Postiglione , Eric P. Solecky
- Applicant: Javier A. Ayala , Marc J. Postiglione , Eric P. Solecky
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agency: Hoffman Warnick LLC
- Agent Steven Capella
- Main IPC: G06F19/00
- IPC: G06F19/00

Abstract:
A system and method for optimizing and implementing a metrology sampling plan. A system is provided that includes a system for collecting historical metrology data from a metrology tool; and a reduction analysis system that compares an initial capability calculated from the historical metrology data with a recalculated capability for a reduced data set, wherein the reduced data set is obtained by removing a subset of data from the historical metrology data.
Public/Granted literature
- US20090119049A1 AUTOMATED DYNAMIC METROLOGY SAMPLING SYSTEM AND METHOD FOR PROCESS CONTROL Public/Granted day:2009-05-07
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