Invention Grant
US07865010B2 Wafer edge inspection and metrology 有权
晶圆边缘检查和计量

Wafer edge inspection and metrology
Abstract:
Some aspects of the present invention relate to a wafer inspection method. A plurality of images is acquired about an edge portion of a wafer. Each of the images comprises a pixel array having a first dimension and a second dimension. A composite image of compressed pixel arrays is generated by compressing each of the pixel arrays in the first dimension and concatenating the pixel arrays. The composite image is analyzed to identify a wafer feature, for example using a sinusoidal line fit.
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