Invention Grant
- Patent Title: Interferometric defect detection
- Patent Title (中): 干涉缺陷检测
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Application No.: US12190144Application Date: 2008-08-12
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Publication No.: US07864334B2Publication Date: 2011-01-04
- Inventor: Hwan J. Jeong
- Applicant: Hwan J. Jeong
- Applicant Address: US CA Sunnyvale
- Assignee: JZW LLC
- Current Assignee: JZW LLC
- Current Assignee Address: US CA Sunnyvale
- Agency: Cooper & Dunham, LLP
- Main IPC: G01N21/00
- IPC: G01N21/00 ; G01B11/02

Abstract:
Methods and systems for using common-path interferometry are described. In some embodiments, a common-path interferometry system for the detection of defects in a sample is described. An illumination source generates and directs coherent light toward the sample. An optical imaging system collects light reflected from the sample including a scattered component of that is predominantly scattered by the sample, and a specular component that is predominantly undiffracted by the sample. A variable phase controlling system is used to adjust the relative phase of the scattered component and the specular component so as to improve the ability to detect defects in the sample.
Public/Granted literature
- US20090296096A1 Interferometric Defect Detection Public/Granted day:2009-12-03
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