Invention Grant
- Patent Title: Position detection method, exposure apparatus, and device manufacturing method
- Patent Title (中): 位置检测方法,曝光装置和装置制造方法
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Application No.: US12368790Application Date: 2009-02-10
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Publication No.: US07864308B2Publication Date: 2011-01-04
- Inventor: Hiroshi Sato
- Applicant: Hiroshi Sato
- Applicant Address: JP Tokyo
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP Tokyo
- Agency: Canon U.S.A., Inc. I.P. Division
- Priority: JP2008-031029 20080212
- Main IPC: G01J1/00
- IPC: G01J1/00

Abstract:
This invention discloses a position detection method for detecting the focus position of an optical position detection apparatus including an image sensor and an optical system which forms an image of a target object on the image sensing surface of the image sensor. In this method, the relationship between the position of the target object in the optical-axis direction of the optical system and the evaluation value of the signal output from the image sensor is measured, and the position of a peak close to a reference focus position, which is selected if the evaluation value has a plurality of peaks in the measured relationship, is detected as the focus position.
Public/Granted literature
- US20090201514A1 POSITION DETECTION METHOD, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD Public/Granted day:2009-08-13
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