Invention Grant
- Patent Title: Binary sinusoidal sub-wavelength gratings as alignment marks
- Patent Title (中): 二进正弦亚波长光栅作为对准标记
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Application No.: US11284407Application Date: 2005-11-22
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Publication No.: US07863763B2Publication Date: 2011-01-04
- Inventor: Richard Johannes Franciscus Van Haren , Sami Musa
- Applicant: Richard Johannes Franciscus Van Haren , Sami Musa
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: H01L23/544
- IPC: H01L23/544
Abstract:
The present invention relates to alignment marks for use on substrates, the alignment marks consisting of periodic 2-dimensional arrays of structures, the spacing of the structures being smaller than an alignment beam but larger than an exposure beam and the width of the structures varying sinusoidally from one end of an array to the other.
Public/Granted literature
- US20070114678A1 Binary sinusoidal sub-wavelength gratings as alignment marks Public/Granted day:2007-05-24
Information query
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