Invention Grant
- Patent Title: Microelectronic devices and methods for manufacturing microelectronic devices
- Patent Title (中): 用于制造微电子器件的微电子器件和方法
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Application No.: US11347863Application Date: 2006-02-06
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Publication No.: US07863727B2Publication Date: 2011-01-04
- Inventor: Rick C. Lake
- Applicant: Rick C. Lake
- Applicant Address: US ID Boise
- Assignee: Micron Technology, Inc.
- Current Assignee: Micron Technology, Inc.
- Current Assignee Address: US ID Boise
- Agency: Perkins Coie LLP
- Main IPC: H01L23/04
- IPC: H01L23/04

Abstract:
Microelectronic devices and methods for manufacturing microelectronic devices are disclosed herein. In one embodiment, a microelectronic device includes a microelectronic die, a plurality of electrical couplers projecting from the die, and a flowable material disposed on the die. The die includes an integrated circuit and a plurality of terminals operably coupled to the integrated circuit. The electrical couplers are attached to corresponding terminals on the die. The flowable material includes a plurality of spacer elements sized to space the die apart from another component. The flowable material may be a no-flow underfill, a flux compound, or other suitable material.
Public/Granted literature
- US20070181992A1 Microelectronic devices and methods for manufacturing microelectronic devices Public/Granted day:2007-08-09
Information query
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