Invention Grant
- Patent Title: Thin film transistor array panel and manufacturing method thereof
- Patent Title (中): 薄膜晶体管阵列面板及其制造方法
-
Application No.: US11980871Application Date: 2007-10-30
-
Publication No.: US07863607B2Publication Date: 2011-01-04
- Inventor: Je-Hun Lee , Do-Hyun Kim , Chang-Oh Jeong
- Applicant: Je-Hun Lee , Do-Hyun Kim , Chang-Oh Jeong
- Applicant Address: KR Gyeonggi-do
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Gyeonggi-do
- Agency: Innovation Counsel LLP
- Priority: KR10-2007-0058216 20070614
- Main IPC: H01L29/786
- IPC: H01L29/786

Abstract:
The disclosed thin film transistor array panel includes an insulating substrate, a channel layer including an oxide formed on the insulating substrate. A gate insulating is layer formed on the channel layer and a gate electrode is formed on the gate insulating layer. An interlayer insulating layer is formed on the gate electrode and a data line formed on the interlayer insulating layer and includes a source electrode, wherein the data line is made of a first conductive layer and a second conductive layer. A drain electrode formed on the interlayer insulating layer, and includes the first conductive layer and the second conductive layer. A pixel electrode extends from the first conductive layer of the drain electrode and a passivation layer formed on the data line and the drain electrode. A spacer formed on the passivation layer.
Public/Granted literature
- US20080308795A1 Thin film transistor array panel and manufacturing method thereof Public/Granted day:2008-12-18
Information query
IPC分类: