Invention Grant
- Patent Title: Plasma reactor
- Patent Title (中): 等离子体反应器
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Application No.: US11723721Application Date: 2007-03-21
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Publication No.: US07863540B2Publication Date: 2011-01-04
- Inventor: Masaaki Masuda , Michio Takahashi , Takeshi Sakuma
- Applicant: Masaaki Masuda , Michio Takahashi , Takeshi Sakuma
- Applicant Address: JP Nagoya
- Assignee: NGK Insulators, Ltd.
- Current Assignee: NGK Insulators, Ltd.
- Current Assignee Address: JP Nagoya
- Agency: Oliff & Berridge, PLC
- Priority: JP2006-094337 20060330
- Main IPC: B23K10/00
- IPC: B23K10/00

Abstract:
The present invention provides a plasma reactor which can suppress deactivation of components (active components) activated by plasma when causing exhaust gas to flow through a plasma generating space to ensure efficient reaction between the active components and particulate matter, whereby the particulate matter can be efficiently purified via reaction. The plasma reactor includes a plasma reactor main body 1, a positive electrode 11 disposed on an inlet side 2 of the plasma reactor main body 1, a conductive honeycomb filter 21 disposed so that a filter inlet side 22 faces an outlet side 3 of the plasma reactor main body 1, and a pulse power supply 31 which is connected with the positive electrode 11 and the honeycomb filter 21 and is capable of applying a pulse voltage between the positive electrode 11 and the honeycomb filter 21 as plasma generating electrodes to generate plasma.
Public/Granted literature
- US20080072574A1 Plasma reactor Public/Granted day:2008-03-27
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