Invention Grant
- Patent Title: Treatment for bonding interface stabilization
- Patent Title (中): 接合界面稳定性的处理
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Application No.: US11807686Application Date: 2007-05-29
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Publication No.: US07863158B2Publication Date: 2011-01-04
- Inventor: Eric Neyret , Sebastien Kerdiles
- Applicant: Eric Neyret , Sebastien Kerdiles
- Applicant Address: FR Bernin
- Assignee: S.O.I.TEC Silicon on Insulator Technologies
- Current Assignee: S.O.I.TEC Silicon on Insulator Technologies
- Current Assignee Address: FR Bernin
- Agency: Edwards Angell Palmer & Dodge LLP
- Agent George W. Neuner, Esq.; Brian R. Pollack, Esq.
- Priority: FR0606440 20060713
- Main IPC: H01L21/30
- IPC: H01L21/30 ; H01L21/46

Abstract:
A method and/or system are provided for producing a structure comprising a thin layer of semiconductor material on a substrate. The method includes creating an area of embrittlement in the thickness of a donor substrate, bonding the donor substrate with a support substrate and detaching the donor substrate at the level of the area of embrittlement to transfer a thin layer of the donor substrate onto the support substrate. The method also includes thermal treatment of this resulting structure to stabilize the bonding interface between the thin layer and the substrate support. The invention also relates to the structures obtained by such a process.
Public/Granted literature
- US20080014718A1 Treatment for bonding interface stabilization Public/Granted day:2008-01-17
Information query
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