Invention Grant
- Patent Title: Process for preparing stable photoresist compositions
- Patent Title (中): 制备稳定光刻胶组合物的方法
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Application No.: US12800013Application Date: 2010-05-06
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Publication No.: US07862983B2Publication Date: 2011-01-04
- Inventor: William Richard Russell , John Anthony Schultz
- Applicant: William Richard Russell , John Anthony Schultz
- Applicant Address: US NC Research Triangle Park
- Assignee: DuPont Electronic Polymers L.P.
- Current Assignee: DuPont Electronic Polymers L.P.
- Current Assignee Address: US NC Research Triangle Park
- Agent James J. Mullen
- Main IPC: G03F7/00
- IPC: G03F7/00 ; G03F7/004 ; C08G79/00

Abstract:
A composition of matter consisting of a stable solution containing a polymer derived from a solution of a polymer containing trace metals, the derived method comprising the steps of: (a) providing a polymer solution containing a polymer, a first solvent and trace metals; (b) passing said polymer solution through an acidic cation ion exchange material to remove said trace metals therefrom and thereby forming a polymer solution containing free acid radicals; (c) precipitating said polymer from said polymer solution of step b by contacting with a second solvent wherein the polymer is substantially insoluble therein; (d) filtering said solution and said second solvent to thereby form a solid polymer cake; and (e) contacting said cake from step d with sufficient quantities of additional said second solvent in order to remove free acid radicals therefrom.
Public/Granted literature
- US20100221653A1 Process for preparing stable photoresist compositions Public/Granted day:2010-09-02
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