Invention Grant
- Patent Title: Vacuum processing apparatus and vacuum processing method
- Patent Title (中): 真空加工设备和真空加工方法
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Application No.: US12230467Application Date: 2008-08-29
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Publication No.: US07862289B2Publication Date: 2011-01-04
- Inventor: Takeshi Oono , Kenji Nakata , Shoji Okiguchi , Tooru Ueno , Hidehiro Oomae , Shigeharu Minami , Yoshitaka Kai
- Applicant: Takeshi Oono , Kenji Nakata , Shoji Okiguchi , Tooru Ueno , Hidehiro Oomae , Shigeharu Minami , Yoshitaka Kai
- Applicant Address: JP Tokyo
- Assignee: Hitachi High-Technologies Corporation
- Current Assignee: Hitachi High-Technologies Corporation
- Current Assignee Address: JP Tokyo
- Agency: Antonelli, Terry, Stout & Kraus, LLP.
- Priority: JP2004-097774 20040330
- Main IPC: B65H85/00
- IPC: B65H85/00

Abstract:
A vacuum processing apparatus and method in which the apparatus includes vacuum processing chambers for subjecting a sample to vacuum processing, a vacuum carriage, a switchable chamber, a cassette support for supporting a plurality of cassettes capable of housing samples, and a waiting cassette support for supporting a waiting cassette that differs from the cassettes supported on the cassette support and capable of having a number of samples. An atmospheric carriage enables carrying a sample among a given cassette of the plurality of cassettes or the waiting cassette. A controller effects control for carrying unprocessed and processed samples among the given cassette, the waiting cassette and the vacuum processing chamber, so that a mixture of both processed and unprocessed samples does not exist in the given cassette or the waiting cassette.
Public/Granted literature
- US20090003978A1 Vacuum processing apparatus and vacuum processing method Public/Granted day:2009-01-01
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