Invention Grant
- Patent Title: Method and apparatus for adjusting a substrate support
- Patent Title (中): 用于调整衬底支撑件的方法和装置
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Application No.: US11786910Application Date: 2007-04-13
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Publication No.: US07861650B2Publication Date: 2011-01-04
- Inventor: John G. Klauser , Ronald J. Forget
- Applicant: John G. Klauser , Ronald J. Forget
- Applicant Address: US IL Glenview
- Assignee: Illinois Tool Works, Inc.
- Current Assignee: Illinois Tool Works, Inc.
- Current Assignee Address: US IL Glenview
- Agency: Lando & Anastasi, LLP
- Main IPC: B05C17/08
- IPC: B05C17/08

Abstract:
A stencil printer for printing viscous material on a substrate includes a frame, a stencil, and a print head to deposit and print viscous material over the stencil. A substrate support supports a substrate in a print position. A substrate support movement assembly includes a first movement mechanism configured to move the substrate support in a first direction, a second movement mechanism configured to move the substrate support in a second direction, the second direction being generally perpendicular to the first direction, and a third movement mechanism, spaced from a first movement mechanism, configured to move the substrate in the first direction. The stencil printer further includes a controller coupled to the substrate support movement assembly to move the substrate support by the first, second and third movement mechanisms in an x-direction, a y-direction and a rotational direction to align the substrate.
Public/Granted literature
- US20080250951A1 Method and apparatus for adjusting a substrate support Public/Granted day:2008-10-16
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