Invention Grant
- Patent Title: Plasma torch for making synthetic silica
- Patent Title (中): 用于制造合成二氧化硅的等离子火炬
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Application No.: US11646362Application Date: 2006-12-28
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Publication No.: US07861557B2Publication Date: 2011-01-04
- Inventor: Mikhail I. Guskov , Mohd A. Aslami , Dau Wu
- Applicant: Mikhail I. Guskov , Mohd A. Aslami , Dau Wu
- Applicant Address: US NY White Plains
- Assignee: Silica Tech, LLC
- Current Assignee: Silica Tech, LLC
- Current Assignee Address: US NY White Plains
- Agency: Patton Boggs LLP
- Main IPC: C03B37/018
- IPC: C03B37/018

Abstract:
The improved plasma torch for making synthetic silica includes use of nitrogen screen gas from outer quartz tubing to provide active environment isolation. In addition, the present induction plasma torch includes a ring disk for more compact but complete environmental protection (360 degree coverage). It also includes offsetting and switching the position of the chemical injection nozzles for allowing improved deposition in both directions, when operated in a horizontal mode. Further, the present induction plasma torch maintains laminar flow for the injected chemicals and the middle quartz tube is provided with a concave section for increasing the average enthalpy of plasma jet, thus improving the efficiency of the plasma torch. In addition, it may utilize more plasma gas inlets. It also includes chemical injection nozzles having a downward angular inclination.
Public/Granted literature
- US20070169516A1 Plasma torch for making synthetic silica Public/Granted day:2007-07-26
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