Invention Grant
- Patent Title: Probe device and method of regulating contact pressure between object to be inspected and probe
- Patent Title (中): 探头装置和调节对象之间的接触压力的探针的方法
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Application No.: US12064167Application Date: 2006-08-23
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Publication No.: US07847569B2Publication Date: 2010-12-07
- Inventor: Toshihiro Yonezawa , Syuichi Tsukada
- Applicant: Toshihiro Yonezawa , Syuichi Tsukada
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: Pearne & Gordon LLP
- Priority: JP2005-244840 20050825
- International Application: PCT/JP2006/316488 WO 20060823
- International Announcement: WO2007/023851 WO 20070301
- Main IPC: G01R31/02
- IPC: G01R31/02 ; G01R31/26

Abstract:
Contact pressure between a wafer and a probe is maintained at an appropriate level. A probe card 2 has a contactor 11 for supporting a probe 10, a printed wiring board 13 electrically connected to the contactor 11, and a reinforcement member 14. On the upper surface side of the probe card 2 is provided a top plate 70 connected to the reinforcement member 14 by a connection member 80. A groove 90 is formed in the upper surface of the top plate 70, and a strain gauge 91 is attached at the groove 90. When a wafer W and the probe 10 are in contact with each other, an upward load acts on the probe card 2 by pressure caused by the contact, and the load causes strain in the top plate 70. The amount of the strain in the top plate 70 is measured, and contact pressure between the wafer W and the probe 10 is regulated and set based on the amount of the strain.
Public/Granted literature
- US20090284272A1 PROBE DEVICE AND METHOD OF REGULATING CONTACT PRESSURE BETWEEN OBJECT TO BE INSPECTED AND PROBE Public/Granted day:2009-11-19
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