Invention Grant
- Patent Title: Multilayer film with stack of nanometer-scale thicknesses
- Patent Title (中): 具有纳米级叠层叠层的多层膜
-
Application No.: US12104252Application Date: 2008-04-16
-
Publication No.: US07847368B2Publication Date: 2010-12-07
- Inventor: Paval Kornilovich , Peter Mardilovich , Sriram Ramamoorthi
- Applicant: Paval Kornilovich , Peter Mardilovich , Sriram Ramamoorthi
- Applicant Address: US TX Houston
- Assignee: Hewlett-Packard Development Company, L.P.
- Current Assignee: Hewlett-Packard Development Company, L.P.
- Current Assignee Address: US TX Houston
- Main IPC: H01L29/00
- IPC: H01L29/00

Abstract:
This disclosure describes system(s) and/or method(s) enabling contacts for individual nanometer-scale-thickness layers of a multilayer film.
Public/Granted literature
- US20090126977A1 MULTILAYER FILM Public/Granted day:2009-05-21
Information query
IPC分类: