Invention Grant
US07847295B2 Thin film transistor, display device using thereof and method of manufacturing the thin film transistor and the display device
有权
薄膜晶体管,其使用的显示装置及薄膜晶体管的制造方法以及显示装置
- Patent Title: Thin film transistor, display device using thereof and method of manufacturing the thin film transistor and the display device
- Patent Title (中): 薄膜晶体管,其使用的显示装置及薄膜晶体管的制造方法以及显示装置
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Application No.: US12026794Application Date: 2008-02-06
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Publication No.: US07847295B2Publication Date: 2010-12-07
- Inventor: Hitoshi Nagata , Naoki Nakagawa
- Applicant: Hitoshi Nagata , Naoki Nakagawa
- Applicant Address: JP Tokyo
- Assignee: Mitsubishi Electric Corporation
- Current Assignee: Mitsubishi Electric Corporation
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2007-066718 20070315
- Main IPC: H01L27/14
- IPC: H01L27/14

Abstract:
A thin film transistor includes a gate electrode, a gate insulating film formed to cover the gate electrode, a semiconductor layer including a channel region formed over the gate electrode, a source electrode and a drain electrode including a region connected to the semiconductor layer, where at least a part of the region is overlapped with the gate electrode, an upper insulating film formed to cover the semiconductor layer, the source electrode and the drain electrode, where the upper insulating film is directly in contact with the channel region of the semiconductor layer and discharges moisture by a heat treatment and a second upper insulating film formed to cover the first protective film and suppress moisture out-diffusion.
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