Invention Grant
- Patent Title: Charged particle beam apparatus
- Patent Title (中): 带电粒子束装置
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Application No.: US12068417Application Date: 2008-02-06
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Publication No.: US07847249B2Publication Date: 2010-12-07
- Inventor: Noritsugu Takahashi , Muneyuki Fukuda , Hiroyuki Ito , Atsuko Fukada , Masashi Sakamoto , Satoshi Takada
- Applicant: Noritsugu Takahashi , Muneyuki Fukuda , Hiroyuki Ito , Atsuko Fukada , Masashi Sakamoto , Satoshi Takada
- Applicant Address: JP Tokyo
- Assignee: Hitachi High-Technologies Corporation
- Current Assignee: Hitachi High-Technologies Corporation
- Current Assignee Address: JP Tokyo
- Agency: Stites & Harbison, PLLC
- Agent Juan Carlos A. Marquez, Esq
- Priority: JP2007-027488 20070207
- Main IPC: H01J3/14
- IPC: H01J3/14

Abstract:
A technology whereby removal of magnetic hysteresis is enabled in short time in parallel with a process for stage transfer, and so forth. There is executed a magnetic hysteresis removal sequence whereby current for exciting an electromagnetic coil prior to acquisition of an image is always set to a predetermined variation value against a target value, thereby obtaining information on an image, and so forth, when a diameter of a primary electron beam, converged on the specimen, becomes smaller than dimensions displayed by one pixel of an image to be acquired.
Public/Granted literature
- US20080185519A1 Charged particle beam apparatus Public/Granted day:2008-08-07
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