Invention Grant
- Patent Title: Wafer and stage alignment using photonic devices
- Patent Title (中): 使用光子器件的晶圆和阶段对准
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Application No.: US11770105Application Date: 2007-06-28
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Publication No.: US07808657B2Publication Date: 2010-10-05
- Inventor: Shahin Zangooie , Lin Zhou
- Applicant: Shahin Zangooie , Lin Zhou
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agency: Cantor Colburn LLP
- Agent Ian MacKinnon
- Main IPC: G01B11/14
- IPC: G01B11/14
Abstract:
A position sensing system for an optical metrology system, includes a plurality of photonic devices distributed on a carrier for providing a photonic response when interrogated with a measuring light, wherein a collective photonic response from the plurality indicates the position of the carrier. A method and an optical metrology system are also provided.
Public/Granted literature
- US20090002721A1 WAFER AND STAGE ALIGNMENT USING PHOTONIC DEVICES Public/Granted day:2009-01-01
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