Invention Grant
- Patent Title: N-type semiconductor materials for thin film transistors
- Patent Title (中): 用于薄膜晶体管的N型半导体材料
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Application No.: US12545337Application Date: 2009-08-21
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Publication No.: US07807994B2Publication Date: 2010-10-05
- Inventor: Deepak Shukla , Diane C. Freeman , Shelby F. Nelson , Jeffrey T. Carey , Wendy G. Ahearn
- Applicant: Deepak Shukla , Diane C. Freeman , Shelby F. Nelson , Jeffrey T. Carey , Wendy G. Ahearn
- Applicant Address: US NY Rochester
- Assignee: Eastman Kodak Company
- Current Assignee: Eastman Kodak Company
- Current Assignee Address: US NY Rochester
- Agent J. Lanny Tucker
- Main IPC: H01L51/00
- IPC: H01L51/00 ; C07D471/02

Abstract:
A thin film transistor comprises a layer of organic semiconductor material comprising a tetracarboxylic diimide naphthalene-based compound having, attached to each of the imide nitrogen atoms, an aromatic moiety, at least one of which moieties is substituted with at least one electron donating group. Such transistors can further comprise spaced apart first and second contact means or electrodes in contact with said material. Further disclosed is a process for fabricating an organic thin-film transistor device, preferably by sublimation deposition onto a substrate, wherein the substrate temperature is no more than 100° C.
Public/Granted literature
- US20090312553A1 N-TYPE SEMICONDUCTOR MATERIALS FOR THIN FILM TRANSISTORS Public/Granted day:2009-12-17
Information query
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