Invention Grant
US07807613B2 Aqueous buffered fluoride-containing etch residue removers and cleaners
有权
含水缓冲氟化物的蚀刻残渣去除剂和清洁剂
- Patent Title: Aqueous buffered fluoride-containing etch residue removers and cleaners
- Patent Title (中): 含水缓冲氟化物的蚀刻残渣去除剂和清洁剂
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Application No.: US10877305Application Date: 2004-06-25
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Publication No.: US07807613B2Publication Date: 2010-10-05
- Inventor: Roberto J. Rovito , Jennifer M. Rieker , Darryl W. Peters
- Applicant: Roberto J. Rovito , Jennifer M. Rieker , Darryl W. Peters
- Applicant Address: US PA Allentown
- Assignee: Air Products and Chemicals, Inc.
- Current Assignee: Air Products and Chemicals, Inc.
- Current Assignee Address: US PA Allentown
- Agent Rosaleen P. Morris-Oskanian; Joseph D. Rossi
- Main IPC: C11D7/50
- IPC: C11D7/50
Abstract:
The invention relates to aqueous, buffered, fluoride containing compositions having a pH of greater than 7.0 to about 11.0. In certain embodiments, the buffered compositions have an extended worklife because pH dependent attributes such as oxide and metal etch rates are stable so long as the pH remains stable.
Public/Granted literature
- US20040266637A1 Aqueous buffered fluoride-containing etch residue removers and cleaners Public/Granted day:2004-12-30
Information query
