Invention Grant
US07807084B2 In-mold dual shot masking 有权
模内双镜屏蔽

In-mold dual shot masking
Abstract:
A method of selectively applying a pattern to a molded part comprises the steps of forming a mold (8); molding a three-dimensional object (10) having at least one face (12) in the mold, the three-dimensional object (10) being formed of a first material. Masking the at least the one face (12) of the three-dimensional object (10) with a mask (14) comprising a reverse image of a desired pattern while the three-dimensional object is still in the mold. Overmolding the three-dimensional object (10) with a second material to provide the reverse image. Removing the three-dimensional object (10) from the mold, coating at least the one face 12 of the three-dimensional object with a third material; and removing the second material to reveal the desired image.
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