Invention Grant
- Patent Title: In-mold dual shot masking
- Patent Title (中): 模内双镜屏蔽
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Application No.: US10941438Application Date: 2004-09-15
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Publication No.: US07807084B2Publication Date: 2010-10-05
- Inventor: Dirk-Martin Skirha, III , Kevin P. Morris , Sanders R. Brott
- Applicant: Dirk-Martin Skirha, III , Kevin P. Morris , Sanders R. Brott
- Applicant Address: US MA Danvers
- Assignee: Osram Sylvania Inc.
- Current Assignee: Osram Sylvania Inc.
- Current Assignee Address: US MA Danvers
- Agent William H. McNeill
- Main IPC: B29C45/14
- IPC: B29C45/14

Abstract:
A method of selectively applying a pattern to a molded part comprises the steps of forming a mold (8); molding a three-dimensional object (10) having at least one face (12) in the mold, the three-dimensional object (10) being formed of a first material. Masking the at least the one face (12) of the three-dimensional object (10) with a mask (14) comprising a reverse image of a desired pattern while the three-dimensional object is still in the mold. Overmolding the three-dimensional object (10) with a second material to provide the reverse image. Removing the three-dimensional object (10) from the mold, coating at least the one face 12 of the three-dimensional object with a third material; and removing the second material to reveal the desired image.
Public/Granted literature
- US20060055079A1 In-mold dual shot masking Public/Granted day:2006-03-16
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