Invention Grant
US07791948B2 Channel carrier discharging in a NAND flash memory on an insulating substrate or layer
失效
通道载体在绝缘基板或层上的NAND闪速存储器中放电
- Patent Title: Channel carrier discharging in a NAND flash memory on an insulating substrate or layer
- Patent Title (中): 通道载体在绝缘基板或层上的NAND闪速存储器中放电
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Application No.: US12165211Application Date: 2008-06-30
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Publication No.: US07791948B2Publication Date: 2010-09-07
- Inventor: Riichiro Shirota , Fumitaka Arai
- Applicant: Riichiro Shirota , Fumitaka Arai
- Applicant Address: JP Tokyo
- Assignee: Kabushiki Kaisha Toshiba
- Current Assignee: Kabushiki Kaisha Toshiba
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2005-133946 20050502
- Main IPC: G11C16/02
- IPC: G11C16/02 ; G11C16/06

Abstract:
A semiconductor memory device includes: a semiconductor layer provided on an insulating substrate or an insulating layer; active areas each defined in the semiconductor layer with a device insulating film buried therein; and NAND cell units formed on the active areas, each NAND cell unit including a plurality of electrically rewritable and non-volatile memory cells connected in series, both ends of each NAND cell unit being coupled to a source line and a bit line, wherein the device has such a carrier discharging mode as to discharge channel carriers in the NAND cell unit to at least one of the source line and the bit line.
Public/Granted literature
- US20090010074A1 SEMICONDUCTOR MEMORY DEVICE Public/Granted day:2009-01-08
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