Invention Grant
- Patent Title: Position measurement system
- Patent Title (中): 位置测量系统
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Application No.: US12458867Application Date: 2009-07-24
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Publication No.: US07791736B2Publication Date: 2010-09-07
- Inventor: Yasuji Seko , Yoshinori Yamaguchi , Yasuyuki Saguchi
- Applicant: Yasuji Seko , Yoshinori Yamaguchi , Yasuyuki Saguchi
- Applicant Address: JP Tokyo
- Assignee: Fuji Xerox Co., Ltd.
- Current Assignee: Fuji Xerox Co., Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Oliff & Berridge, PLC
- Priority: JP2005-358687 20051213
- Main IPC: G01B11/02
- IPC: G01B11/02

Abstract:
A position measurement system for measuring positional coordinates of a point under measurement includes a first noise removal unit, a parameter determination unit and a second noise removal unit. The first noise removal unit removes noise from the measured positional coordinates to acquire first positional coordinate values. The parameter determination unit determines a noise removal parameter on a basis of the first positional coordinate values. The second noise removal unit again removes noise from the first positional coordinate values with using the noise removal parameter, to acquire second positional coordinate values.
Public/Granted literature
- US20090310142A1 Position measurement system Public/Granted day:2009-12-17
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