Invention Grant
- Patent Title: Method and apparatus for angular-resolved spectroscopic lithography characterization
- Patent Title (中): 用于角分辨光谱光刻特征的方法和装置
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Application No.: US10918742Application Date: 2004-08-16
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Publication No.: US07791727B2Publication Date: 2010-09-07
- Inventor: Arie Jeffrey Den Boef , Mircea Dusa , Antoine Gaston Marie Kiers , Maurits Van Der Schaar
- Applicant: Arie Jeffrey Den Boef , Mircea Dusa , Antoine Gaston Marie Kiers , Maurits Van Der Schaar
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- Main IPC: G01B9/02
- IPC: G01B9/02 ; G01B11/00
Abstract:
An apparatus and method to determine a property of a substrate by measuring, in the pupil plane of a high numerical aperture lens, an angle-resolved spectrum as a result of radiation being reflected off the substrate. The property may be angle and wavelength dependent and may include the intensity of TM- and TE-polarized light and their relative phase difference.
Public/Granted literature
- US20060033921A1 Method and apparatus for angular-resolved spectroscopic lithography characterization Public/Granted day:2006-02-16
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