Invention Grant
US07791711B2 Projection method including pupillary filtering and a projection lens therefor 有权
投影方法包括瞳孔滤光和投影透镜

Projection method including pupillary filtering and a projection lens therefor
Abstract:
Processes for producing semiconductor components and/or other finely structured components include providing a projection objective having a mirror that is located within a predetermined proximity to a pupil surface of a projection objective. In one variant, an image of a pattern is projected onto a light-sensitive substrate in multiple exposures, in which a first pupil filter function is set on the mirror during a first exposure and, during a subsequent, second exposure, a different, second pupil filter function is set by local changes of geometric reflective properties of the mirror in a locally resolving manner.
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