Invention Grant
- Patent Title: Projection method including pupillary filtering and a projection lens therefor
- Patent Title (中): 投影方法包括瞳孔滤光和投影透镜
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Application No.: US12036903Application Date: 2008-02-25
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Publication No.: US07791711B2Publication Date: 2010-09-07
- Inventor: Hubert Holderer , Christian Hembd-Soellner , Rudolf Von Buenau , Ulrich Haag
- Applicant: Hubert Holderer , Christian Hembd-Soellner , Rudolf Von Buenau , Ulrich Haag
- Applicant Address: DE Oberkochen
- Assignee: Carl Zeiss SMT AG
- Current Assignee: Carl Zeiss SMT AG
- Current Assignee Address: DE Oberkochen
- Agency: Sughrue Mion, PLLC
- Priority: DE10220324 20020429
- Main IPC: G03B27/32
- IPC: G03B27/32 ; G03B27/42 ; G03B27/54

Abstract:
Processes for producing semiconductor components and/or other finely structured components include providing a projection objective having a mirror that is located within a predetermined proximity to a pupil surface of a projection objective. In one variant, an image of a pattern is projected onto a light-sensitive substrate in multiple exposures, in which a first pupil filter function is set on the mirror during a first exposure and, during a subsequent, second exposure, a different, second pupil filter function is set by local changes of geometric reflective properties of the mirror in a locally resolving manner.
Public/Granted literature
- US20080143984A1 PROJECTION METHOD INCLUDING PUPILLARY FILTERING AND A PROJECTION LENS THEREFOR Public/Granted day:2008-06-19
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