Invention Grant
- Patent Title: Substrate support and lithographic process
- Patent Title (中): 基板支撑和光刻工艺
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Application No.: US12000100Application Date: 2007-12-07
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Publication No.: US07791709B2Publication Date: 2010-09-07
- Inventor: Pieter Renaat Maria Hennus , Frits Van Der Meulen , Joost Jeroen Ottens , Peter Paul Steijaert , Hubert Matthieu Richard Steijns , Peter Smits
- Applicant: Pieter Renaat Maria Hennus , Frits Van Der Meulen , Joost Jeroen Ottens , Peter Paul Steijaert , Hubert Matthieu Richard Steijns , Peter Smits
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- Main IPC: G03B27/58
- IPC: G03B27/58 ; G03B27/42 ; G03B27/52
Abstract:
A substrate support constructed to support a substrate for immersion lithographic processing is disclosed. The substrate support has a central part and a peripheral part positioned around the central part. The substrate support further includes a thermal decoupler arranged to decrease heat transport between the central part and the peripheral part.
Public/Granted literature
- US20080158526A1 Substrate support and lithographic process Public/Granted day:2008-07-03
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