Invention Grant
- Patent Title: Stage mechanism, electron microscope having the stage mechanism and method of controlling positioning of stage mechanism
- Patent Title (中): 舞台机制,具有阶段机制的电子显微镜和控制舞台机构定位的方法
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Application No.: US12038358Application Date: 2008-02-27
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Publication No.: US07791043B2Publication Date: 2010-09-07
- Inventor: Eiichi Seya , Takashi Nagamatsu
- Applicant: Eiichi Seya , Takashi Nagamatsu
- Applicant Address: JP Tokyo
- Assignee: Hitachi High-Technologies Corporation
- Current Assignee: Hitachi High-Technologies Corporation
- Current Assignee Address: JP Tokyo
- Agency: Crowell & Moring LLP
- Priority: JP2007-053271 20070302
- Main IPC: H01J37/20
- IPC: H01J37/20

Abstract:
An electron microscope stage mechanism capable of performing high-accuracy positioning while limiting vibration and drift. An ultrasonic motor is used in a stage drive mechanism, and a fixing mechanism capable of increasing stop stiffness is combined integrally with the motor. That is, a structure in which a piezoelectric actuator of the fixing mechanism is mounted in a pre-load mechanism together with the ultrasonic motor is used. When the stage is fixed by the fixing mechanism after acceleration, deceleration and positioning of the stage performed by the drive mechanism, the piezoelectric actuators positioned on opposite sides of the stage are extended to press the stage.
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