Invention Grant
- Patent Title: Packaging device and packaging method for hollow cathode type sputtering target
- Patent Title (中): 空心阴极溅射靶的包装装置及包装方法
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Application No.: US10575937Application Date: 2004-09-14
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Publication No.: US07788882B2Publication Date: 2010-09-07
- Inventor: Takeo Okabe , Masaru Nagasawa
- Applicant: Takeo Okabe , Masaru Nagasawa
- Applicant Address: JP Tokyo
- Assignee: Nippon Mining & Metals Co., Ltd.
- Current Assignee: Nippon Mining & Metals Co., Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Howson & Howson LLP
- Priority: JP2003-354456 20031015
- International Application: PCT/JP2004/013343 WO 20040914
- International Announcement: WO2005/037649 WO 20050428
- Main IPC: B65B31/00
- IPC: B65B31/00 ; B67B3/24

Abstract:
Provided are a packaging device and packaging method of a hollow cathode sputtering target which installs, in the hollow cathode sputtering target, a cover of a size capable of covering a void of the target; provides one or more through-holes to the cover; places a resin bag over them, and performs vacuum suction to the inside of the bag. This packaging device and packaging method of a hollow cathode sputtering target is capable of performing vacuum suction even to the inside of the hollow portion covered with the resin bag.
Public/Granted literature
- US20070131545A1 Packaging device and packaging method for hollow cathode type sputtering target Public/Granted day:2007-06-14
Information query