Invention Grant
US07769482B2 Methods and systems for controlling a semiconductor fabrication process
有权
用于控制半导体制造工艺的方法和系统
- Patent Title: Methods and systems for controlling a semiconductor fabrication process
- Patent Title (中): 用于控制半导体制造工艺的方法和系统
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Application No.: US11877228Application Date: 2007-10-23
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Publication No.: US07769482B2Publication Date: 2010-08-03
- Inventor: Patrick D. Pannese , Vinaya Kavathekar , Peter van der Meulen
- Applicant: Patrick D. Pannese , Vinaya Kavathekar , Peter van der Meulen
- Applicant Address: US MA Chelmsford
- Assignee: Brooks Automation, Inc.
- Current Assignee: Brooks Automation, Inc.
- Current Assignee Address: US MA Chelmsford
- Agency: Perman & Green, LLP
- Agent Richard Pickreign
- Main IPC: G06F19/00
- IPC: G06F19/00 ; G05B7/00

Abstract:
Software for controlling processes in a heterogeneous semiconductor manufacturing environment may include a wafer-centric database, a real-time scheduler using a neural network, and a graphical user interface displaying simulated operation of the system. These features may be employed alone or in combination to offer improved usability and computational efficiency for real time control and monitoring of a semiconductor manufacturing process. More generally, these techniques may be usefully employed in a variety of real time control systems, particularly systems requiring complex scheduling decisions or heterogeneous systems constructed of hardware from numerous independent vendors.
Public/Granted literature
- US20080155448A1 METHODS AND SYSTEMS FOR CONTROLLING A SEMICONDUCTOR FABRICATION PROCESS Public/Granted day:2008-06-26
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