Invention Grant
- Patent Title: Method for cutting substrate using femtosecond laser
- Patent Title (中): 使用飞秒激光切割基板的方法
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Application No.: US11168953Application Date: 2005-06-28
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Publication No.: US07767555B2Publication Date: 2010-08-03
- Inventor: Jeong Kweon Park
- Applicant: Jeong Kweon Park
- Applicant Address: KR Seoul
- Assignee: LG. Display Co., Ltd.
- Current Assignee: LG. Display Co., Ltd.
- Current Assignee Address: KR Seoul
- Agency: Brinks Hofer Gilson & Lione
- Priority: KR10-2004-0089702 20041105
- Main IPC: H01L21/00
- IPC: H01L21/00

Abstract:
A method for cutting a substrate is disclosed which uses a femtosecond laser capable of preventing thermal expansion and generation of shock waves from occurring around a region where a cutting process is carried out when the femtosecond laser is used to cut the substrate, thereby being capable of achieving a reduction in costs. The method includes the steps of arranging the substrate on a stage, and irradiating a femtosecond laser to a predetermined portion of the substrate arranged on the stage, thereby cutting the substrate along the predetermined substrate portion.
Public/Granted literature
- US20060096962A1 Method for cutting substrate using femtosecond laser Public/Granted day:2006-05-11
Information query
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