Invention Grant
- Patent Title: Multilayer structure forming method, method of manufacturing wiring board, and method manufacturing of electronic apparatus
- Patent Title (中): 多层结构形成方法,制造布线板的方法和电子设备的方法制造
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Application No.: US11222851Application Date: 2005-09-12
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Publication No.: US07767252B2Publication Date: 2010-08-03
- Inventor: Tsuyoshi Shintate , Kazuaki Sakurada , Jun Yamada
- Applicant: Tsuyoshi Shintate , Kazuaki Sakurada , Jun Yamada
- Applicant Address: JP Tokyo
- Assignee: Seiko Epson Corporation
- Current Assignee: Seiko Epson Corporation
- Current Assignee Address: JP Tokyo
- Agency: Oliff & Berridge, PLC
- Priority: JP2004-278981 20040927; JP2004-297213 20041012; JP2005-220146 20050729
- Main IPC: H01L21/20
- IPC: H01L21/20

Abstract:
A droplet discharge apparatus is used in a multilayer structure forming method of the invention. The multilayer structure forming method includes: discharging droplets of a first conductive material to form a first conductive material pattern on a surface of an object; baking the first conductive material pattern to form a wiring pattern; discharging droplets of a first insulating material including a first photo-curable material to form a first insulating material pattern bordering via holes on the wiring pattern; curing the first insulating material pattern to form a first insulating pattern bordering the via holes; making the surface of the object lyophilic; discharging droplets of a second insulating material including a second photo-curable material to form a second insulating material pattern that covers the wiring pattern and the surface of the object which has been made lyophilic, and surrounds the first insulating pattern; and curing the second insulating material pattern to form a second insulating pattern that surrounds the first insulating pattern. In addition, preferably, the first conductive material includes silver (Ag) nanoparticles.
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