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US07751248B2 Indirect measurement of negative margin voltages in endurance testing of EEPROM cells 有权
在EEPROM单元的耐久性测试中间接测量负余量电压

Indirect measurement of negative margin voltages in endurance testing of EEPROM cells
Abstract:
An electronic test structure and method for testing non-volatile memory cells. The structure includes a first transistor coupled in series to a floating gate transistor whereby a source of the first transistor is coupled to a positive power supply voltage and a source of the floating gate transistor is coupled to a power supply ground. A gate of the first transistor is further coupled to a source of the first transistor. A second transistor is coupled in series with a memory cell with a source of the second transistor coupled to a positive power supply voltage and a gate of the second transistor is coupled to the drain of the first transistor.
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