Invention Grant
US07751248B2 Indirect measurement of negative margin voltages in endurance testing of EEPROM cells
有权
在EEPROM单元的耐久性测试中间接测量负余量电压
- Patent Title: Indirect measurement of negative margin voltages in endurance testing of EEPROM cells
- Patent Title (中): 在EEPROM单元的耐久性测试中间接测量负余量电压
-
Application No.: US12037880Application Date: 2008-02-26
-
Publication No.: US07751248B2Publication Date: 2010-07-06
- Inventor: Philip S. Ng , Minh V. Le , Liqi Wang , Jinshu Son
- Applicant: Philip S. Ng , Minh V. Le , Liqi Wang , Jinshu Son
- Applicant Address: US CA San Jose
- Assignee: Atmel Corporation
- Current Assignee: Atmel Corporation
- Current Assignee Address: US CA San Jose
- Agency: Schwegman, Lundberg & Woessner, P.A.
- Main IPC: G11C11/34
- IPC: G11C11/34

Abstract:
An electronic test structure and method for testing non-volatile memory cells. The structure includes a first transistor coupled in series to a floating gate transistor whereby a source of the first transistor is coupled to a positive power supply voltage and a source of the floating gate transistor is coupled to a power supply ground. A gate of the first transistor is further coupled to a source of the first transistor. A second transistor is coupled in series with a memory cell with a source of the second transistor coupled to a positive power supply voltage and a gate of the second transistor is coupled to the drain of the first transistor.
Public/Granted literature
- US20080144386A1 INDIRECT MEASUREMENT OF NEGATIVE MARGIN VOLTAGES IN ENDURANCE TESTING OF EEPROM CELLS Public/Granted day:2008-06-19
Information query