Invention Grant
US07751243B2 Semiconductor memory device provided with MOS transistor having charge accumulation layer and control gate and data write method of NAND flash memory
失效
具有具有电荷累积层的MOS晶体管和NAND闪存的控制栅极和数据写入方法的半导体存储器件
- Patent Title: Semiconductor memory device provided with MOS transistor having charge accumulation layer and control gate and data write method of NAND flash memory
- Patent Title (中): 具有具有电荷累积层的MOS晶体管和NAND闪存的控制栅极和数据写入方法的半导体存储器件
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Application No.: US12208798Application Date: 2008-09-11
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Publication No.: US07751243B2Publication Date: 2010-07-06
- Inventor: Katsuaki Isobe , Noboru Shibata
- Applicant: Katsuaki Isobe , Noboru Shibata
- Applicant Address: JP Tokyo
- Assignee: Kabushiki Kaisha Toshiba
- Current Assignee: Kabushiki Kaisha Toshiba
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2007-236861 20070912
- Main IPC: G11C11/34
- IPC: G11C11/34

Abstract:
A semiconductor memory device includes a memory cell group, a selection transistor, a page buffer, and a row decoder. The memory cell group includes memory cell transistors connected in series. The selection transistor is connected to the memory cell transistor. The page buffer is adopted to apply first and second voltages to the bit lines connected to the memory cell transistors in which the “0” data and “1” data is to be programmed respectively, when the selection transistor is turned on, in a write operation. The page buffer is adopted to put the bit line into electrically floating after the first voltage and the second voltage are applied. The row decoder is adopted to apply a third voltage to a semiconductor layer on which the memory cell transistors are formed, and apply a program voltage to the selected word line when the bit line is in the electrically floating.
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