Invention Grant
- Patent Title: Apparatus for rubbing alignment layer on a substrate
- Patent Title (中): 用于在衬底上摩擦取向层的装置
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Application No.: US11889680Application Date: 2007-08-15
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Publication No.: US07751023B2Publication Date: 2010-07-06
- Inventor: Pin-Chun Wu , Chih-Chieh Chang , Chih-Hsiung Weng , Tsung-Yuan Chang
- Applicant: Pin-Chun Wu , Chih-Chieh Chang , Chih-Hsiung Weng , Tsung-Yuan Chang
- Applicant Address: TW Tao Yuan Shien
- Assignee: Quanta Display Inc.
- Current Assignee: Quanta Display Inc.
- Current Assignee Address: TW Tao Yuan Shien
- Agency: Bacon & Thomas, PLLC
- Priority: TW96101129A 20070111
- Main IPC: G02F1/13
- IPC: G02F1/13 ; G02F1/1337

Abstract:
An apparatus for rubbing an alignment layer on a substrate is disclosed. The apparatus includes a platform to support the substrate; a conveyance unit incorporating the platform to convey the substrate in a predetermined direction; a rubbing roller located above the platform for rubbing the alignment layer on the substrate; a combing unit located at one side of the rubbing roller for contacting with the rubbing roller; and at least one vacuum suction unit located at one side of the platform to suck and remove the particles released from the rubbing. The combing unit serves to smoothen a rubbing cloth on the rubbing roller, with a result of low static electricity accumulation on the substrate and of a better alignment effect on the alignment layer.
Public/Granted literature
- US20080170191A1 Apparatus for rubbing alignment layer on a substrate Public/Granted day:2008-07-17
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