Invention Grant
- Patent Title: Junction barrier Schottky diode with dual silicides
- Patent Title (中): 具有双重硅化物的结型势垒肖特基二极管
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Application No.: US11849565Application Date: 2007-09-04
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Publication No.: US07750426B2Publication Date: 2010-07-06
- Inventor: Dev Alok Girdhar , Michael David Church , Alexander Kalnitsky
- Applicant: Dev Alok Girdhar , Michael David Church , Alexander Kalnitsky
- Applicant Address: US CA Milipitas
- Assignee: Intersil Americas, Inc.
- Current Assignee: Intersil Americas, Inc.
- Current Assignee Address: US CA Milipitas
- Main IPC: H01L27/095
- IPC: H01L27/095 ; H01L29/47 ; H01L31/07

Abstract:
An integrated circuit, including a junction barrier Schottky diode, has an N type well, a P-type anode region in the surface of the well, and an N-type Schottky region in the surface of the well and horizontally abutting the anode region. A first silicide layer is on and makes a Schottky contact to the Schottky region and is on an adjoining anode region. A second silicide layer of a different material than the first silicide is on the anode region. An ohmic contact is made to the second silicide on the anode region and to the well.
Public/Granted literature
- US20080296721A1 Junction Barrier Schottky Diode with Dual Silicides and Method of Manufacture Public/Granted day:2008-12-04
Information query
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