Invention Grant
- Patent Title: Process for producing acid adduct salt of polyacidic base compound
- Patent Title (中): 生产多酸基化合物酸加合盐的方法
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Application No.: US10545200Application Date: 2004-02-27
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Publication No.: US07750150B2Publication Date: 2010-07-06
- Inventor: Kimiyuki Shibuya , Tadaaki Ohgiya , Takayuki Matsuda
- Applicant: Kimiyuki Shibuya , Tadaaki Ohgiya , Takayuki Matsuda
- Applicant Address: JP Nagoya-shi
- Assignee: Kowa Co., Ltd.
- Current Assignee: Kowa Co., Ltd.
- Current Assignee Address: JP Nagoya-shi
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2003-052700 20030228
- International Application: PCT/JP2004/002375 WO 20040227
- International Announcement: WO2004/076441 WO 20040910
- Main IPC: C07D243/00
- IPC: C07D243/00 ; C07D241/04 ; C07D295/00
Abstract:
This invention relates to a method for preparing an acid addition salt of a polyacidic basic compound, or a water adduct having basic site(s) stronger than pyridine. The method comprises reacting the polyacidic basic compound with an acid salt of pyridine.By the present invention, the number of moles of an added acid in the acid addition salt of the polyacidic basic compound can be readily changed to a number suited for the polyacidic basic compound as needed.
Public/Granted literature
- US20060079688A1 Process for producing acid adduct salt of polyacidic base compound Public/Granted day:2006-04-13
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