Invention Grant
- Patent Title: Photocatalytic apatite-containing resin
- Patent Title (中): 含光催化磷灰石的树脂
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Application No.: US11325491Application Date: 2006-01-05
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Publication No.: US07750064B2Publication Date: 2010-07-06
- Inventor: Masato Wakamura , Noriyasu Aso
- Applicant: Masato Wakamura , Noriyasu Aso
- Applicant Address: JP Kawasaki
- Assignee: Fujitsu Limited
- Current Assignee: Fujitsu Limited
- Current Assignee Address: JP Kawasaki
- Agency: Kratz, Quintos & Hanson, LLP
- Priority: JP2003-195483 20030711
- Main IPC: B01J23/00
- IPC: B01J23/00 ; C09D5/14 ; C08K3/10 ; C08K3/22

Abstract:
An antibacterial measure using titanium oxide includes mixing titanium oxide in a resin to form a coating resin, and then coating a key surface with the coating resin. This method requires formation of a coating layer on a resin molding and thus increases the number of the production steps and cost. Furthermore, in the method, a coating film containing an antibacterial agent is scraped off light by little at each time of keying, and thus the film is finally completely removed to lose its antibacterial function. A conceivable measure against this includes directly mixing a resin and an antibacterial agent. However, titanium oxide used as an antibacterial agent degrades a raw material resin. It has recently be thought that photocatalytic apatite as a substitute for titanium oxide also causes chalking, and an antibacterial coating layer has been formed on a surface of a resin molding. However, the inventor of the present invention found that photocatalytic apatite does not cause chalking, thereby achieving a resin containing the photocatalytic apatite.
Public/Granted literature
- US20060111460A1 Photocatalytic apatite-containing resin Public/Granted day:2006-05-25
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