Invention Grant
- Patent Title: Method for producing a high-resolution surface pattern
- Patent Title (中): 用于制造高分辨率表面图案的方法
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Application No.: US10564506Application Date: 2004-07-16
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Publication No.: US07748321B2Publication Date: 2010-07-06
- Inventor: Ludwig Brehm , Dieter Geim
- Applicant: Ludwig Brehm , Dieter Geim
- Applicant Address: DE Furth
- Assignee: Leonhard Kurz Stiftung & Co. KG
- Current Assignee: Leonhard Kurz Stiftung & Co. KG
- Current Assignee Address: DE Furth
- Agency: Hoffmann & Baron, LLP
- Priority: DE10333255 20030721
- International Application: PCT/DE2004/001554 WO 20040716
- International Announcement: WO2005/009742 WO 20050203
- Main IPC: B41F19/02
- IPC: B41F19/02

Abstract:
The invention concerns a process for producing a high-resolution surface pattern on a substrate and a multi-layer body produced by means of that process and an apparatus for carrying out the process. A printing substance is applied in pattern form to the substrate by means of a printing process. For fine structuring of the surface pattern, prior to application of the printing substance, a microscopic surface structure with a plurality of grooves is replicated into the surface of the substrate. The fine structuring of the surface pattern is determined by the respective locally applied application amount of printing substance and the respective local relief parameters of the microscopic surface structure in particular orientation direction and profile shape.
Public/Granted literature
- US20070095224A1 Method for producing a high-resolution surface pattern Public/Granted day:2007-05-03
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