Invention Grant
US07732858B2 High voltage integration circuit with freewheeling diode embedded in transistor
有权
具有嵌入晶体管的续流二极管的高压集成电路
- Patent Title: High voltage integration circuit with freewheeling diode embedded in transistor
- Patent Title (中): 具有嵌入晶体管的续流二极管的高压集成电路
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Application No.: US11603671Application Date: 2006-11-22
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Publication No.: US07732858B2Publication Date: 2010-06-08
- Inventor: Taeg-hyun Kang , Sung-son Yun
- Applicant: Taeg-hyun Kang , Sung-son Yun
- Applicant Address: KR Bucheon
- Assignee: Fairchild Korea Semiconductor, Ltd.
- Current Assignee: Fairchild Korea Semiconductor, Ltd.
- Current Assignee Address: KR Bucheon
- Agency: Sidley Austin LLP
- Priority: KR10-2005-0111881 20051122
- Main IPC: H01L29/94
- IPC: H01L29/94

Abstract:
A high voltage integrated circuit contains a freewheeling diode embedded in a transistor. It further includes a control block controlling a high voltage transistor and a power block—including the high voltage transistor—isolated from the control block by a device isolation region. The high voltage transistor includes a semiconductor substrate of a first conductivity type, a epitaxial layer of a second conductivity type on the semiconductor substrate, a buried layer of the second conductivity type between the semiconductor substrate and the epitaxial layer, a collector region of the second conductivity type on the buried layer, a base region of the first conductivity type on the epitaxial layer, and an emitter region of the second conductivity type formed in the base region. The power block further includes a deep impurity region of the first conductivity type near the collector region to form a PN junction.
Public/Granted literature
- US20070132008A1 High voltage integration circuit with freewheeling diode embedded in transistor Public/Granted day:2007-06-14
Information query
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