Invention Grant
- Patent Title: Methods and systems for identifying defect types on a wafer
- Patent Title (中): 用于识别晶片上的缺陷类型的方法和系统
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Application No.: US11949473Application Date: 2007-12-03
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Publication No.: US07728969B2Publication Date: 2010-06-01
- Inventor: Jason Saito , Wei-Ning Shen
- Applicant: Jason Saito , Wei-Ning Shen
- Applicant Address: US CA Milpitas
- Assignee: KLA-Tencor Technologies Corp.
- Current Assignee: KLA-Tencor Technologies Corp.
- Current Assignee Address: US CA Milpitas
- Agent Ann Marie Mewherter
- Main IPC: G01N21/00
- IPC: G01N21/00

Abstract:
Various methods and systems for identifying defect types on a wafer are provided. One computer-implemented method for identifying defect types on a wafer includes acquiring output of an inspection system for defects detected on a wafer. The output is acquired by different combinations of illumination and collection channels of the inspection system. The method also includes identifying defect types of the defects based on the output acquired by a set of the different combinations. The set of the different combinations is selected based on the defect types to be identified on the wafer and a wafer type of the wafer such that a different set of the different combinations of the illumination and collection channels is used for identifying different defect types on different wafer types.
Public/Granted literature
- US20080129988A1 METHODS AND SYSTEMS FOR IDENTIFYING DEFECT TYPES ON A WAFER Public/Granted day:2008-06-05
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