Invention Grant
- Patent Title: Lithographic apparatus, radiation supply and device manufacturing method
- Patent Title (中): 平版印刷设备，辐射源和器件制造方法
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Application No.: US11384859Application Date: 2006-03-21
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Publication No.: US07728955B2Publication Date: 2010-06-01
- Inventor: Robert-Han Munnig Schmidt
- Applicant: Robert-Han Munnig Schmidt
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C
- Main IPC: G03B27/72
- IPC: G03B27/72
Abstract:
A system for controlling the radiation dose in a pulse of radiation having a relatively large dose, in which a pulsed beam of radiation is divided into a plurality of pulsed sub-beams of radiation and the radiation dose of the pulses is adjusted after the radiation beam has been divided.
Public/Granted literature
- US20070222961A1 Lithographic apparatus, radiation supply and device manufacturing method Public/Granted day:2007-09-27
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