Invention Grant
US07710579B2 Measuring method and apparatus for measuring depth of trench pattern
有权
用于测量沟槽图案深度的测量方法和装置
- Patent Title: Measuring method and apparatus for measuring depth of trench pattern
- Patent Title (中): 用于测量沟槽图案深度的测量方法和装置
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Application No.: US11889391Application Date: 2007-08-13
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Publication No.: US07710579B2Publication Date: 2010-05-04
- Inventor: Shinji Yamaguchi , Masahiro Horie
- Applicant: Shinji Yamaguchi , Masahiro Horie
- Applicant Address: JP Kyoto
- Assignee: Dainippon Screen Mfg. Co., Ltd.
- Current Assignee: Dainippon Screen Mfg. Co., Ltd.
- Current Assignee Address: JP Kyoto
- Agency: McDermott Will & Emery LLP
- Priority: JPP2006-228597 20060825; JPP2007-101307 20070409
- Main IPC: G01B11/02
- IPC: G01B11/02

Abstract:
In a trench shape measuring apparatus, a substrate having a trench pattern extending in a predetermined trench direction on a measurement area is held by a holding part. A light emission part applies illumination light to the measurement area and reflected light of the illumination light from the measurement area is spectrally dispersed by a diffraction grating of a spectroscope, to acquire a measured spectral reflectance. Since the diffraction grating is arranged so that an angle formed between a direction on the substrate corresponding to a grating direction of the diffraction grating and the trench direction becomes 45 degrees, even if an oscillation direction of the reflected light from the substrate is limited by influence of the trench pattern, it is possible to accurately obtain a spectral reflectance of the measurement area without influence of polarization of the reflected light and obtain a depth of the trench pattern with accuracy.
Public/Granted literature
- US20080049222A1 Measuring method and apparatus for measuring depth of trench pattern Public/Granted day:2008-02-28
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