Invention Grant
- Patent Title: Nonvolatile semiconductor memory device
- Patent Title (中): 非易失性半导体存储器件
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Application No.: US11802463Application Date: 2007-05-23
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Publication No.: US07709883B2Publication Date: 2010-05-04
- Inventor: Tamae Takano , Atsushi Tokuda , Ryota Tajima , Shunpei Yamazaki
- Applicant: Tamae Takano , Atsushi Tokuda , Ryota Tajima , Shunpei Yamazaki
- Applicant Address: unknown Atsugi-shi, Kanagawa-ken
- Assignee: Semiconductor Energy Laboratory Co., Ltd
- Current Assignee: Semiconductor Energy Laboratory Co., Ltd
- Current Assignee Address: unknown Atsugi-shi, Kanagawa-ken
- Agency: Robinson Intellectual Property Law Office, P.C.
- Agent Eric J. Robinson
- Priority: JP2006-153516 20060601
- Main IPC: H01L29/788
- IPC: H01L29/788

Abstract:
An object is to provide a nonvolatile semiconductor memory device which is excellent in a writing property and a charge retention property. In addition, another object is to provide a nonvolatile semiconductor memory device capable of reducing writing voltage. A nonvolatile semiconductor memory device includes a semiconductor layer or a semiconductor substrate including a channel formation region between a pair of impurity regions that are formed apart from each other, and a first insulating layer, a plurality of layers formed of different nitride compounds, a second insulating layer, and a control gate that are formed in a position which is over the semiconductor layer or the semiconductor substrate and overlaps with the channel formation region.
Public/Granted literature
- US20070278563A1 Nonvolatile semiconductor memory device Public/Granted day:2007-12-06
Information query
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