Invention Grant
- Patent Title: In-place bonding of microstructures
- Patent Title (中): 微结构的就地结合
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Application No.: US12248941Application Date: 2008-10-10
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Publication No.: US07709352B2Publication Date: 2010-05-04
- Inventor: Guy M. Cohen , Patricia M. Mooney , Vamsi K. Paruchuri
- Applicant: Guy M. Cohen , Patricia M. Mooney , Vamsi K. Paruchuri
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agency: Scully, Scott, Murphy & Presser, P.C.
- Agent Vazken Alexanian
- Main IPC: H01L21/784
- IPC: H01L21/784

Abstract:
A method for bonding microstructures to a semiconductor substrate using attractive forces, such as, hydrophobic, van der Waals, and covalent bonding is provided. The microstructures maintain their absolute position with respect to each other and translate vertically onto a wafer surface during the bonding process. The vertical translation of the micro-slabs is also referred to herein as “in-place bonding”. Semiconductor structures which include the attractively bonded microstructures and substrate are also disclosed.
Public/Granted literature
- US20090035919A1 IN-PLACE BONDING OF MICROSTRUCTURES Public/Granted day:2009-02-05
Information query
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