Invention Grant
- Patent Title: Soft pellicle and method of making same
- Patent Title (中): 软胶囊及其制作方法
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Application No.: US12241624Application Date: 2008-09-30
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Publication No.: US07709180B2Publication Date: 2010-05-04
- Inventor: Paul A. Zimmerman , Chris Van Peski
- Applicant: Paul A. Zimmerman , Chris Van Peski
- Applicant Address: US TX Austin
- Assignee: Sematech, Inc.
- Current Assignee: Sematech, Inc.
- Current Assignee Address: US TX Austin
- Agency: Fulbright & Jaworski, L.L.P.
- Main IPC: G03F7/00
- IPC: G03F7/00 ; G03F7/004
Abstract:
The present invention relates generally to the fields of semiconductor lithography. More particularly, it concerns methods, compositions, and apparatuses relating to 157 nm, 167 nm, 193 nm, 248 nm, 365 nm, and 436 nm soft pellicles and the use of perfluorinated polymers in the creation of pellicles.
Public/Granted literature
- US20090081567A1 SOFT PELLICLE AND METHOD OF MAKING SAME Public/Granted day:2009-03-26
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