Invention Grant
- Patent Title: Method for masking selected regions of a substrate
- Patent Title (中): 用于掩蔽基底的选定区域的方法
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Application No.: US10409523Application Date: 2003-04-08
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Publication No.: US07709057B2Publication Date: 2010-05-04
- Inventor: Robert Anthony Fusaro, Jr. , Timothy Francis Bethel
- Applicant: Robert Anthony Fusaro, Jr. , Timothy Francis Bethel
- Applicant Address: US NY Niskayuna
- Assignee: General Electric Company
- Current Assignee: General Electric Company
- Current Assignee Address: US NY Niskayuna
- Agency: Fletcher Yoder
- Main IPC: B05D3/12
- IPC: B05D3/12 ; B05D1/36 ; B05D7/00 ; C23C4/02 ; C23C4/06 ; C23C4/10

Abstract:
Described herein is a method for providing a clean edge at the interface of a portion of a substrate coated with a coating system and an adjacent portion of the substrate which is uncoated. The method includes the step of forming a zone of non-adherence on the substrate portion which is to be uncoated, prior to application of the coating system. The zone of non-adherence is adjacent the interface, so that the coating system will not adhere to the zone of non-adherence, but will adhere to the portion of the substrate which is to be coated with the coating system.
Public/Granted literature
- US20040009297A1 Method for masking selected regions of a substrate Public/Granted day:2004-01-15
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