Invention Grant
- Patent Title: Imprint lithography
- Patent Title (中): 印刷光刻
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Application No.: US11185971Application Date: 2005-07-21
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Publication No.: US07708924B2Publication Date: 2010-05-04
- Inventor: Aleksey Yurievich Kolesnychenko , Helmar Van Santen , Yvonne Wendela Kruijt-Stegeman
- Applicant: Aleksey Yurievich Kolesnychenko , Helmar Van Santen , Yvonne Wendela Kruijt-Stegeman
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman, LLP
- Main IPC: B28B11/08
- IPC: B28B11/08
Abstract:
A lithographic apparatus is disclosed that has a template holder configured to hold an imprint template, a substrate table arranged to receive a substrate, a radiation output arranged to illuminate a part of the imprint template, and a detector configured to detect radiation scattered from an interface between the imprint template and imprintable material provided on the substrate.
Public/Granted literature
- US20070018360A1 Imprint lithography Public/Granted day:2007-01-25
Information query
