Invention Grant
- Patent Title: Magnetic random access memory and method of manufacturing the same
- Patent Title (中): 磁性随机存取存储器及其制造方法
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Application No.: US11839265Application Date: 2007-08-15
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Publication No.: US07706175B2Publication Date: 2010-04-27
- Inventor: Keiji Hosotani , Yoshiaki Asao , Akihiro Nitayama
- Applicant: Keiji Hosotani , Yoshiaki Asao , Akihiro Nitayama
- Applicant Address: JP Tokyo
- Assignee: Kabushiki Kaisha Toshiba
- Current Assignee: Kabushiki Kaisha Toshiba
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2006-269334 20060929
- Main IPC: G11C11/00
- IPC: G11C11/00

Abstract:
A magnetic random access memory includes a first wiring, a second wiring formed above and spaced apart from the first wiring, a magnetoresistive effect element formed between the first wiring and the second wiring, formed in contact with an upper surface of the first wiring, and having a fixed layer, a recording layer, and a nonmagnetic layer formed between the fixed layer and the recording layer, a metal layer formed on the magnetoresistive effect element and integrated with the magnetoresistive effect element to form stacked layers, a first side insulating film formed on side surfaces of the metal layer, the magnetoresistive effect element, and the first wiring, a first contact formed in contact with a side surface of the first side insulating film, and a third wiring formed on the metal layer and the first contact to electrically connect the magnetoresistive effect element and the first contact.
Public/Granted literature
- US20080080233A1 MAGNETIC RANDOM ACCESS MEMORY AND METHOD OF MANUFACTURING THE SAME Public/Granted day:2008-04-03
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