Invention Grant
- Patent Title: Test pattern and method of monitoring defects using the same
- Patent Title (中): 使用相同的测试模式和监测缺陷的方法
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Application No.: US11852625Application Date: 2007-09-10
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Publication No.: US07705621B2Publication Date: 2010-04-27
- Inventor: Hyock-Jun Lee , Choel-Hwyi Bae , Yeong-Lyeol Park , Nam-Young Lee , Mi-Joung Lee
- Applicant: Hyock-Jun Lee , Choel-Hwyi Bae , Yeong-Lyeol Park , Nam-Young Lee , Mi-Joung Lee
- Applicant Address: KR Suwon-Si
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Suwon-Si
- Agency: F. Chau & Associates, LLC
- Priority: KR10-2006-0087559 20060911
- Main IPC: G01R31/26
- IPC: G01R31/26

Abstract:
A test pattern includes a normal pattern, an abnormal pattern having predetermined defects, and a conductive line electrically connected to the normal pattern and electrically isolated from the abnormal pattern. Thus, a non-contact test process and a contact test process may be compatible with the single test pattern.
Public/Granted literature
- US20080084223A1 TEST PATTERN AND METHOD OF MONITORING DEFECTS USING THE SAME Public/Granted day:2008-04-10
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