Invention Grant
- Patent Title: Sequential lateral solidification device and method of crystallizing silicon using the same
- Patent Title (中): 顺序侧向凝固装置及使用其结晶硅的方法
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Application No.: US10880318Application Date: 2004-06-30
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Publication No.: US07700892B2Publication Date: 2010-04-20
- Inventor: Yun Ho Jung
- Applicant: Yun Ho Jung
- Applicant Address: KR Seoul
- Assignee: LG Display Co., Ltd.
- Current Assignee: LG Display Co., Ltd.
- Current Assignee Address: KR Seoul
- Agency: McKenna Long & Aldridge LLP
- Priority: KR10-2003-0064507 20030917
- Main IPC: B23K26/04
- IPC: B23K26/04

Abstract:
A sequential lateral solidification device and a method of crystallizing silicon using the same controls a size and arrangement overlapping areas of laser beam patterns adjacently irradiated onto a substrate to within specific regions of a pixel area and a driving area outside the pixel area. The device includes a laser generating device irradiating a laser beam, a focusing lens focusing the laser beam, a mask having a pattern of transparent regions permitting the laser beam to be transmitted a laser beam pattern, a reduction lens reducing the laser beam pattern transmitted by the mask, a substrate having a pixel area and a driving area exposed to the irradiated laser beam pattern, a moveable stage having, on which the substrate is mounted, and a position sensor sensing an position of the irradiated laser beam pattern and controlling a size and arrangement overlapping areas between adjacently irradiated laser beam patterns.
Public/Granted literature
- US20050056623A1 Sequential lateral solidification device and method of crystallizing silicon using the same Public/Granted day:2005-03-17
Information query
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